The Institute of Electronics, National Academy of Science of Belarus. Minsk
The paper describes a technique for automated
measurements of specific and surface resistances of semiconductor films
and wafers 0.2 to 400 mkm thick of any configuration by the Van-der-Pau
method in a pulse mode using an IBM PC personal computer, digital voltmeters
B7-21A, program controlled pulse generator, sample-and-hold device, programmed
switch and adapter-multiplexer. It provides automatic switching of probe
contacts, programmed setting of voltage and current pulses from 10 to 40
mks, measurement of surface resistance in the range of 0.05 to 22*10**6
Om and specific resistance in the range of 2*10**(-3) to 10**6 Om*cm at
a thickness of 400 mkm with data output onto a monitor and printer. The
error of resistance measurement is < = 0.8 %.