SELECTION  AND  OPTIMIZATION  OF  THE  SPECTROPHOTOMETER  STRUCTURAL SCHEME  FOR  DIFFUSE
REFLECTANCE  MEASUREMENTS
(PART 2)

E. V. Kuvaldin

S.I. Vavilov State Optical Institute, Saint-Petersburg

 
    The described method of optimization consists of two parts. The first part [1] is devoted to selection of the optical schematic providing minimal losses, the second one presents the methods for optimization of the receiving path, electric measuring circuit and also for minimization of measurement error. The main problems and the ways of their solving are discussed.